The gas-sensing properties of WO3−xthin films deposited via the atmospheric pressure chemical vapour deposition (APCVD) of WCl6with ethanol
- 22 January 2008
- journal article
- Published by IOP Publishing in Measurement Science and Technology
Abstract
No abstract availableThis publication has 17 references indexed in Scilit:
- A microstructural model of semiconducting gas sensor response: The effects of sintering temperature on the response of chromium titanate (CTO) to carbon monoxideSensors and Actuators B: Chemical, 2006
- Atmospheric Pressure Chemical Vapor Deposition of Crystalline Monoclinic WO3 and WO3-x Thin Films from Reaction of WCl6 with O-Containing Solvents and Their Photochromic and Electrochromic PropertiesChemistry of Materials, 2005
- Control of semiconducting oxide gas-sensor microstructure by application of an electric field during aerosol-assisted chemical vapour depositionJournal of Materials Chemistry, 2004
- Electrochromic tungsten oxide films: Review of progress 1993–1998Solar Energy Materials and Solar Cells, 2000
- Preparation and characterization of pyrolytic spray deposited electrochromic tungsten trioxide filmsThin Solid Films, 2000
- Characterization of pulsed laser deposited WO3 thin films for electrochromic devicesApplied Surface Science, 1999
- Characterization of sol-gel prepared WO3 thin films as a gas sensorJournal of Vacuum Science & Technology A, 1999
- Chemical vapor deposition of tungsten oxideApplied Organometallic Chemistry, 1998
- ElectrochromismPublished by Wiley ,1995
- Optical and photoelectric properties and colour centres in thin films of tungsten oxidePhilosophical Magazine, 1973