Study of interface roughness dependence of electron mobility in Si inversion layers using the Monte Carlo method
- 15 January 1996
- journal article
- research article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 79 (2), 911-916
- https://doi.org/10.1063/1.360871
Abstract
The electron mobility in the inversion layer of a metal–oxide semiconductor field effect transistor formed on the (100) silicon surface is calculated by using a Monte Carlo approach which takes into account size quantization, acoustic phonon scattering, intervalley phonon scattering and surface roughness scattering. Degeneracy is also considered because it is important at higher normal effective fields (high gate voltages). The main emphasis is placed on the influence of the specific autocovariance function, used to describe the surface roughness, on the electron mobility. Here we compare the mobilities obtained using exponential and Gaussian autocovariance functions. It is found that the electron mobility calculated with roughness scattering rates based on the exponential function shows good agreement with experiments. The effect of the degeneracy and screening on the roughness scattering is also discussed.Keywords
This publication has 18 references indexed in Scilit:
- Scaling Analysis of SiO2/Si Interface Roughness by Atomic Force MicroscopyJapanese Journal of Applied Physics, 1994
- Monte Carlo study of electron transport in silicon inversion layersPhysical Review B, 1993
- Temperature Dependence of Electron Mobility in Si Inversion LayersJapanese Journal of Applied Physics, 1991
- Electron Mobility in Si Inversion LayersJapanese Journal of Applied Physics, 1989
- A Self-Consistent Monte Carlo Simulation for Two-Dimensional Electron Transport in MOS Inversion LayerJapanese Journal of Applied Physics, 1987
- Normal Electric Field Dependence of Electron Mobility in MOS Inversion LayerJapanese Journal of Applied Physics, 1986
- Surface roughness at the Si(100)-interfacePhysical Review B, 1985
- High-field drift velocity of electrons at the Si–SiO2 interface as determined by a time-of-flight techniqueJournal of Applied Physics, 1983
- Two-dimensional electron transport in semiconductor layers. I. Phonon scatteringAnnals of Physics, 1981
- Electron scattering in silicon inversion layers by oxide and surface roughnessSurface Science, 1976