Radiation blistering of polycrystalline niobium by helium-ion implantation

Abstract

The radiation blistering of polycrystallineniobiumsurfaces at room temperature has been investigated for different doses of helium ionsimplanted at 0.5 MeV and for different amounts of initial defect structure in the samples. The cold‐worked samples show large blisters (up to 500 μm in diameter), many of which are ruptured. In samples annealed before irradiation, the blistering at low doses (0.1 C/cm2) was lower than in the cold‐worked sample, but at a higher dose (1.0 C/cm2) the blistering was even greater. The observation of interconnecting bubbles offers a possible explanation for the formation of such large blisters at low temperatures.