In this paper we given a modular account of the grammar of additive particles. In doing this we take issue with the standard descriptions of focus particles, which are based on just one possible pattern: the particle preceding the main stressed constituent it relates to (its RC). Additive particles, however, occur in a second, equally unmarked pattern: the RC preceding the main stressed particle. Former accounts do not only miss this complementary distribution as to position and stress pattern relative to the RC, but, as we demonstrate in detail, they misrepresent the relation between syntax, semantics and focus structure of these (and similar) particles in general.