Improvements on the electrical and luminescent properties of reactive molecular beam epitaxially grown GaN films by using AlN-coated sapphire substrates
- 1 March 1983
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 42 (5), 427-429
- https://doi.org/10.1063/1.93952
Abstract
The electrical and luminescent properties of the GaN epitaxial films grown on AlN-coated sapphire by reactive molecular beam epitaxy have been studied. The GaN films on AlN epitaxial films have larger Hall mobilities and show more intense cathodoluminescence peaks at a wavelength of 360 nm than those of the GaN films grown directly on sapphire, which suggests that the crystal qualities of GaN films are improved by use of AlN-coated sapphire as substrates. The lattice matching and small difference of the thermal expansion coefficients between GaN and AlN are considered to result in the improvements.Keywords
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