Bond length variation in TOn−4 tetrahedral oxyanions of the third row elements: T = Al, Si, P, S and Cl
- 30 November 1972
- journal article
- Published by Elsevier BV in Materials Research Bulletin
- Vol. 7 (11), 1281-1292
- https://doi.org/10.1016/0025-5408(72)90107-9
Abstract
No abstract availableKeywords
This publication has 35 references indexed in Scilit:
- Mean X–O bond lengths of the XO4n–tetrahedral oxyanionsJ. Chem. Soc. A, 1971
- Bonding in orthophosphates and orthosulphatesSpectrochimica Acta, 1966
- Refinements of structures containing bonds between Si, P, S or Cl and O or N. I. NaPO3NH3Acta Crystallographica, 1964
- Refinements of structures containing bonds between Si, P, S or Cl and O or N. II. Na4P2O7.10H2OActa Crystallographica, 1964
- Refinements of structures containing bonds between Si, P, S or Cl and O or N. V. P4O10Acta Crystallographica, 1964
- Refinements of structures containing bonds between Si, P, S or Cl and O or N. IV. (NH4)4P4O12Acta Crystallographica, 1964
- Refinements of structures containing bonds between Si, P, S or Cl and O or N. III. Na5P3O10, phase IIActa Crystallographica, 1964
- THE SULPHUR–OXYGEN BOND IN SULPHURYL AND THIONYL COMPOUNDS: CORRELATION OF STRETCHING FREQUENCIES AND FORCE CONSTANTS WITH BOND LENGTHS, BOND ANGLES, AND BOND ORDERSCanadian Journal of Chemistry, 1963
- 1077. The rôle of 3d-orbitals in π-bonds between (a) silicon, phosphorus, sulphur, or chlorine and (b) oxygen or nitrogenJournal of the Chemical Society, 1961
- Interatomic Distances and Bond Character in the Oxygen Acids and Related SubstancesThe Journal of Physical Chemistry, 1952