Subwavelength Si nanowire arrays for self-cleaning antireflection coatings
- 18 October 2010
- journal article
- research article
- Published by Royal Society of Chemistry (RSC) in Journal of Materials Chemistry
- Vol. 20 (48), 10924-10930
- https://doi.org/10.1039/c0jm00524j
Abstract
Galvanic wet etching was adopted to fabricate Si nanowire arrays (NWAs) as a near-perfect subwavelength structure (SWS), which is an optically effective gradient-index antireflection (AR) surface and also exhibits super-hydrophobicity with an extremely high water contact angle (159°). Fresnel reflection and diffuse reflection over the broad spectrum can be eliminated by a Si NWA AR coating. Moreover, Si NWA SWSs show polarization-independent and omnidirectional AR properties. The wavelength-averaged specular and diffuse reflectance of Si NWA SWSs are as low as 0.06% and 2.51%, respectively. The effects of the surface profile of this biomimetic SWS on the AR and super-hydrophobic properties were investigated systematically.Keywords
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