Chemical Modification and Patterning of Iodine-Terminated Silicon Surfaces Using Visible Light
- 8 February 2002
- journal article
- research article
- Published by American Chemical Society (ACS) in The Journal of Physical Chemistry B
- Vol. 106 (10), 2656-2664
- https://doi.org/10.1021/jp013523h
Abstract
No abstract availableKeywords
This publication has 24 references indexed in Scilit:
- Metallic Conduction through Engineered DNA: DNA Nanoelectronic Building BlocksPhysical Review Letters, 2001
- Electrochemical and Electrical Behavior of (111)-Oriented Si Surfaces Alkoxylated through Oxidative Activation of Si−H BondsThe Journal of Physical Chemistry B, 2000
- Electronically Configurable Molecular-Based Logic GatesScience, 1999
- Dissociation of a Surface Bond by Direct Optical Excitation: H-Si(100)Physical Review Letters, 1999
- Fermi level pinning on HF etched silicon surfaces investigated by photoelectron spectroscopyJournal of Vacuum Science & Technology A, 1999
- Photoactivated Preparation and Patterning of Self-Assembled Monolayers with 1-Alkenes and Aldehydes on Silicon Hydride SurfacesAngewandte Chemie-International Edition, 1998
- Bioreactive Self-Assembled Monolayers on Hydrogen-Passivated Si(111) as a New Class of Atomically Flat Substrates for Biological Scanning Probe MicroscopyJournal of Structural Biology, 1997
- Effectiveness of 0.08 molar iodine in ethanol solution as a means of chemical surface passivation for photoconductance decay measurementsSolar Energy Materials and Solar Cells, 1997
- PHOTOCHEMICAL LINKAGE OF ANTIBODIES TO SILICON CHIPSPhotochemistry and Photobiology, 1995
- Reaction of NH4F/HF solutions on Si (100) and Si (111) surfacesJournal of Vacuum Science & Technology A, 1993