Influence of the Plasma Chemistry on the Composition of ZrOx and NbOx Thin Films Deposited by Reactive Magnetron Sputtering
- 7 April 2006
- journal article
- Published by Springer Science and Business Media LLC in Plasma Chemistry and Plasma Processing
- Vol. 26 (2), 197-203
- https://doi.org/10.1007/s11090-006-9001-y
Abstract
No abstract availableKeywords
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