Low-dimensional Mott material: Transport in ultrathin epitaxial LaNiO3 films
Open Access
- 8 February 2010
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 96 (6), 062114
- https://doi.org/10.1063/1.3309713
Abstract
Electrical resistivity and magnetotransport are explored for thin (3–30 nm), epitaxial films. Films were grown on three different substrates to obtain films that are coherently strained, with different signs and magnitude of film strain. It is shown that -band transport is inhibited as the layers progress from compression to tension. The Hall coefficient is “holelike.” Increasing tensile strain causes the film resistivity to increase, causing strong localization to appear below a critical thickness.
Keywords
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