Removal of NO from Gas by Corona Discharge with H2O2 Solution Oxidation
- 1 August 2013
- journal article
- Published by Trans Tech Publications, Ltd. in Advanced Materials Research
- Vol. 742, 323-326
- https://doi.org/10.4028/www.scientific.net/amr.742.323
Abstract
The effects of the supply voltage, water flow rate, concentration of H2O2 absorption and flue gas flow rate on NO removal rate were studied. The chemical reaction mechanism of NO removal was discussed. It was concluded that the NO removal rate increased the increasing of supply voltage, water flow rate and concentration of H2O2, and decreased with the increasing of the flue gas flow rate on the experimental conditions. On the synergy with corona discharge and H2O2 solution oxidation, NO removal rate reached 60.2%.Keywords
This publication has 8 references indexed in Scilit:
- Systematic mechanism study of the high temperature SCR of NO by NH3 over a W/TiO2 catalystChemical Engineering Science, 2012
- Kinetic model of NO removal from SO2-containing simulated flue gas by wet UV/H2O2 advanced oxidation processChemical Engineering Journal, 2011
- NO removal by reducing agents and additives in the selective non-catalytic reduction (SNCR) processChemosphere, 2006
- Combined plasma-catalytic processing of nitrous oxideApplied Catalysis B: Environment and Energy, 2001
- Oxidation of nitric oxide in a two-stage chemical scrubber using dc corona dischargeJournal of Hazardous Materials, 2000
- Urea-SCR: a promising technique to reduce NOx emissions from automotive diesel enginesCatalysis Today, 2000
- Removal of NOx by DC and pulsed corona discharges in a wet electrostatic precipitator modelJournal of Electrostatics, 1998
- Low temperature SNCR process for NOx controlScience of The Total Environment, 1997