Dual-beam focused ion beam/electron microscopy processing and metrology of redeposition during ion–surface 3D interactions, from micromachining to self-organized picostructures
- 12 May 2009
- journal article
- Published by IOP Publishing in Journal of Physics: Condensed Matter
- Vol. 21 (22), 224013
- https://doi.org/10.1088/0953-8984/21/22/224013
Abstract
Focused ion beam (FIB) tools have become a mainstay for processing and metrology of small structures. In order to expand the understanding of an ion impinging a surface (Sigmund sputtering theory) to our processing of small structures, the significance of 3D boundary conditions must be realized. We consider ion erosion for patterning/lithography, and optimize yields using the angle of incidence and chemical enhancement, but we find that the critical 3D parameters are aspect ratio and redeposition. We consider focused ion beam sputtering for micromachining small holes through membranes, but we find that the critical 3D considerations are implantation and redeposition. We consider ion beam self-assembly of nanostructures, but we find that control of the redeposition by ion and/or electron beams enables the growth of nanostructures and picostructures.Keywords
This publication has 67 references indexed in Scilit:
- Shocks in Ion Sputtering Sharpen Steep Surface FeaturesScience, 2005
- Spontaneous Pattern Formation from Focused and Unfocused Ion Beam IrradiationMRS Proceedings, 2001
- Mechanisms of ion beam mixing in metals and semiconductorsJournal of Applied Physics, 1998
- Ion beams in silicon processing and characterizationJournal of Applied Physics, 1997
- Applications of ion-beam-assisted depositionMaterials Science and Engineering: A, 1991
- Dynamics and structure of energetic displacement cascadesNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1988
- Characterization of damage in ion implanted GeApplied Physics Letters, 1982
- Technology and applications of broad-beam ion sources used in sputtering. Part II. ApplicationsJournal of Vacuum Science and Technology, 1982
- A mechanism of surface micro-roughening by ion bombardmentJournal of Materials Science, 1973
- Theory of Sputtering. I. Sputtering Yield of Amorphous and Polycrystalline TargetsPhysical Review B, 1969