Reactive D.C. sputtering with the magnetron-plasmatron for tantalum pentoxide and titanium dioxide films
- 1 November 1979
- journal article
- Published by Elsevier BV in Thin Solid Films
- Vol. 63 (2), 369-375
- https://doi.org/10.1016/0040-6090(79)90042-7
Abstract
No abstract availableKeywords
This publication has 9 references indexed in Scilit:
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- High-rate sputtering of enhanced aluminum mirrorsJournal of Vacuum Science and Technology, 1977
- Use of the ring gap plasmatron for high rate sputteringThin Solid Films, 1977
- Film deposition with the Sputter GunJournal of Vacuum Science and Technology, 1977
- D.C. cathode sputtering: influence of the oxygen content in the gas flow on the discharge currentThin Solid Films, 1976
- Reactive sputtering of metals in oxidizing atmospheresThin Solid Films, 1973