Low temperature growth of diamond films by microwave plasma chemical vapor deposition using CH4 +CO2 gas mixtures
- 30 April 1994
- journal article
- Published by Elsevier BV in Diamond and Related Materials
- Vol. 3 (4-6), 443-447
- https://doi.org/10.1016/0925-9635(94)90200-3
Abstract
No abstract availableThis publication has 18 references indexed in Scilit:
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