Massively parallel algorithms for scattering in optical lithography
- 1 January 1991
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems
- Vol. 10 (9), 1091-1100
- https://doi.org/10.1109/43.85755
Abstract
No abstract availableThis publication has 24 references indexed in Scilit:
- Massive parallel computing: a solution of today's and tomorrow's device and process simulation problems?Published by Institute of Electrical and Electronics Engineers (IEEE) ,2003
- Investigation of reflective notching with massively parallel simulationPublished by SPIE-Intl Soc Optical Eng ,1990
- Modeling Of Optical Alignment Images For Semiconductor StructuresPublished by SPIE-Intl Soc Optical Eng ,1989
- Optical microscope imaging of lines patterned in thick layers with variable edge geometry: theoryJournal of the Optical Society of America A, 1988
- A New Line Width Standard For Reflected Light InspectionPublished by SPIE-Intl Soc Optical Eng ,1988
- Point-matched time domain finite element methods for electromagnetic radiation and scatteringIEEE Transactions on Antennas and Propagation, 1987
- Two-Dimensional Simulation of Photolithography on Reflective Stepped SubstrateIEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems, 1987
- Theoretical Models For The Optical Alignment Of Wafer SteppersPublished by SPIE-Intl Soc Optical Eng ,1987
- Absorbing Boundary Conditions for the Finite-Difference Approximation of the Time-Domain Electromagnetic-Field EquationsIEEE Transactions on Electromagnetic Compatibility, 1981
- Numerical Method for the Analysis of Diffraction Gratings*Journal of the Optical Society of America, 1971