Selective chemical vapor deposition of tungsten for microelectromechanical structures
- 15 November 1989
- journal article
- Published by Elsevier BV in Sensors and Actuators
- Vol. 20 (1-2), 123-133
- https://doi.org/10.1016/0250-6874(89)87110-0
Abstract
No abstract availableKeywords
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- High Resolution Trilayer Electron Beam Resist System Employing P[Mma/Maa] And Reliable Reactive Ion Etch ProcessesPublished by SPIE-Intl Soc Optical Eng ,1988
- Application of selective CVD tungsten for low contact resistance via filling to aluminum multilayer interconnectionJournal of Electronic Materials, 1988
- Silicon as a mechanical materialProceedings of the IEEE, 1982