Microstructure/dielectric property relationship of low temperature synthesised (Na,K)NbOx thin films
- 1 February 2004
- journal article
- Published by Elsevier BV in Journal of Crystal Growth
- Vol. 262 (1-4), 322-326
- https://doi.org/10.1016/j.jcrysgro.2003.10.035
Abstract
No abstract availableKeywords
This publication has 17 references indexed in Scilit:
- Optical waveguiding in magnetron-sputtered Na0.5K0.5NbO3 thin films on sapphire substratesApplied Physics Letters, 2003
- High-performance epitaxial Na0.5K0.5NbO3 thin films by magnetron sputteringApplied Physics Letters, 2002
- Na 0.5 K 0.5 NbO 3 thin films for voltage controlled acoustoelectric device applicationsApplied Physics Letters, 2002
- Low-frequency and microwave performances of laser-ablated epitaxial Na0.5K0.5NbO3 films on high-resistivity SiO2/Si substratesJournal of Applied Physics, 2002
- Microwave properties of tunable capacitors basee on magnetron sputtered ferroelectric Na0.5K0.5NbO3 film on low and high resistivity silicon substratesIntegrated Ferroelectrics, 2001
- RF-Magnetron Sputtered Au/(Na,K)NbO3/SiO2/Si MFIS-diode StructuresMRS Proceedings, 2001
- Background oxygen effects on pulsed laser deposited Na0.5K0.5NbO3 films: From superparaelectric state to ferroelectricityJournal of Applied Physics, 2000
- Na 0.5 K 0.5 NbO 3 /SiO 2 /Si thin film varactorApplied Physics Letters, 2000
- Ferroelectric Na0.5K0.5NbO3/SiO2/Si Thin Film Structures for Nonvolatile MemoryMRS Proceedings, 2000
- Self-assembling ferroelectric Na0.5K0.5NbO3 thin films by pulsed-laser depositionApplied Physics Letters, 1999