Source–Drain Engineering Using Atomically Controlled Heterojunctions for Next-Generation SiGe Transistor Applications
- 1 January 2011
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 50 (1R), 010101
- https://doi.org/10.1143/jjap.50.010101
Abstract
Using low-temperature molecular-beam epitaxy techniques on the (111) plane of Si or Ge, we can realize an atomically controlled Fe3Si/Si or Fe3Si/Ge heterojunction and simultaneously obtain D O 3-ordered crystal structures of Fe3Si films. First, high-quality Fe3Si/Si(111) Schottky tunnel contacts enable us to inject and detect spin-polarized electrons in Si conduction channels at ∼180 K, where Fe3Si is a ferromagnetic spin injector and detector. This may lead to the accelerated development of next-generation Si-based spin metal–oxide–semiconductor field-effect transistors (MOSFETs). Next, for the atomically controlled Fe3Si/Ge(111) Schottky contacts, we find the unexpected suppression of the Fermi level pinning (FLP) effect. This indicates that there is an influence of extrinsic contributions such as dangling bonds and disorder on the strong FLP effect at metal/Ge interfaces. We expect that the Fe3Si/Ge(111) contacts can be used to control the Schottky barrier height of future ultra scaled Ge-channel MOSFETs. These two novel and interesting results are expected to form the basis of a key technology toward developing next-generation SiGe transistors.Keywords
This publication has 66 references indexed in Scilit:
- High-quality single-crystal Ge stripes on quartz substrate by rapid-melting-growthApplied Physics Letters, 2009
- Electrical injection and detection of spin-polarized electrons in silicon through an Fe3Si/Si Schottky tunnel barrierApplied Physics Letters, 2009
- Spin injection in silicon at zero magnetic fieldApplied Physics Letters, 2009
- Alleviation of Fermi-level pinning effect on metal/germanium interface by insertion of an ultrathin aluminum oxideApplied Physics Letters, 2008
- Geometric dephasing-limited Hanle effect in long-distance lateral silicon spin transport devicesApplied Physics Letters, 2008
- Spin transport in lateral ferromagnetic/nonmagnetic hybrid structuresJournal of Physics: Condensed Matter, 2007
- Tunable spin-tunnel contacts to silicon using low-work-function ferromagnetsNature Materials, 2006
- Activation and diffusion studies of ion-implanted p and n dopants in germaniumApplied Physics Letters, 2003
- Large Tunneling Magnetoresistance at Room Temperature Using a Heusler Alloy with the B2 StructureJapanese Journal of Applied Physics, 2003
- Influence of substrate orientation on surface segregation process in silicon-MBEThin Solid Films, 1989