Polymers in conventional and alternative lithography for the fabrication of nanostructures
Open Access
- 19 August 2011
- journal article
- review article
- Published by Elsevier BV in European Polymer Journal
- Vol. 47 (11), 2033-2052
- https://doi.org/10.1016/j.eurpolymj.2011.07.025
Abstract
No abstract availableKeywords
This publication has 100 references indexed in Scilit:
- Nanoimprint LithographyOptik & Photonik, 2010
- Fabrication of complex 3D structures using Step and Flash Imprint Lithography (S-FIL)Microelectronic Engineering, 2008
- A comparison of thermally and photochemically cross-linked polymers for nanoimprintingMicroelectronic Engineering, 2003
- Fabrication of Si-based nanoimprint stamps with sub-20 nm featuresMicroelectronic Engineering, 2002
- Nanometer and high aspect ratio patterning by electron beam lithography using a simple DUV negative tone resistMicroelectronic Engineering, 2001
- A contribution to the flow behaviour of thin polymer films during hot embossing lithographyMicroelectronic Engineering, 2001
- Polyferrocenylsilanes: Metal-Containing Polymers for Materials Science, Self-Assembly and Nanostructure ApplicationsMacromolecular Rapid Communications, 2001
- Novel linear and crosslinking polymers for nanoimprinting with high etch resistanceMicroelectronic Engineering, 2000
- Fabrication of nanostructures using a UV-based imprint techniqueMicroelectronic Engineering, 2000
- Properties of thin anti-adhesive films used for the replication of microstructures in polymersMicroelectronic Engineering, 1997