Nonequilibrium volume plasma chemical processing
- 1 December 1991
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Plasma Science
- Vol. 19 (6), 1063-1077
- https://doi.org/10.1109/27.125031
Abstract
A review is presented of plasma chemical processes occurring in the volume part of electrical nonequilibrium discharges. The role of energetic electrons as initiators of chemical reactions in a cold background gas is discussed. Different discharge types of (glow, corona, silent, RF, and microwave discharges) are investigated with respect to their suitability for plasma processing. Emphasis is placed on the requirements of initiating and maintaining the discharge and, at the same time, optimizing plasma parameters for the desired chemical process. Using large-scale industrial ozone production as an example, the detailed process of discharge optimization is described. Other applications of volume plasma processing include other plasma chemical syntheses as well as decomposition processes such as flue gas treatment and hazardous waste disposal. The author only deals with plasmas which are not in equilibrium.Keywords
This publication has 20 references indexed in Scilit:
- Generation of excimer emission in dielectric barrier dischargesApplied Physics B Laser and Optics, 1991
- Silent discharges for the generation of ultraviolet and vacuum ultraviolet excimer radiationPublished by Walter de Gruyter GmbH ,1990
- Preparation of inorganic materials, surface treatment, and etching in low pressure plasmas: Present status and future trendsPlasma Chemistry and Plasma Processing, 1989
- Combined removal of SO/sub 2/, NO/sub x/, and fly ash from simulated flue gas using pulsed streamer coronaIEEE Transactions on Industry Applications, 1989
- Pulse corona induced plasma chemical process: a horizon of new plasma chemical technologiesPublished by Walter de Gruyter GmbH ,1988
- Impulse corona simulation for flue gas treatmentPublished by Walter de Gruyter GmbH ,1988
- Ozone synthesis from oxygen in dielectric barrier dischargesJournal of Physics D: Applied Physics, 1987
- Microwave and RF surface wave sustained discharges as plasma sources for plasma chemistry and plasma processingPlasma Chemistry and Plasma Processing, 1986
- Corona DischargesPublished by Elsevier BV ,1978
- Development of electron avalances and streamersSoviet Physics Uspekhi, 1975