Dry etch selectivity of a-C:H hardmasks for sub-65nm patterning applications
- 23 June 2009
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
- Vol. 27 (4), 1809-1812
- https://doi.org/10.1116/1.3151836
Abstract
No abstract availableThis publication has 11 references indexed in Scilit:
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