The effects of supercritical CO2 formulations on the removal of high-dose ion-implanted photoresists
- 31 August 2013
- journal article
- Published by Elsevier BV in Microelectronic Engineering
- Vol. 108, 50-56
- https://doi.org/10.1016/j.mee.2013.03.163
Abstract
No abstract availableKeywords
Funding Information
- National Natural Science Foundation of China (61250013, 60876075)
- Shandong Information Industry Development (2008R0048)
- Science and Technology Development Research Project of Shandong Province (2008GG30003007)
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