Si Deposition from Chlorosilanes: II . Numerical Analysis of Thermofluid Effects on Deposition

Abstract

Based on the effusive flux model developed in Part I (the preceding article), various effects of flow and thermal fields are investigated numerically for deposition from dilutely mixed in hydrogen passing through a rectangular reactor. Generation and transport of and near the deposition surface is examined in detail. Thermofluid effects on deposition are presented in terms of such nondimensional parameters as the inverse Graetz number and the Rayleigh number.