Graphoepitaxial Assembly of Symmetric Block Copolymers on Weakly Preferential Substrates
- 30 August 2010
- journal article
- research article
- Published by Wiley in Advanced Materials
- Vol. 22 (38), 4325-4329
- https://doi.org/10.1002/adma.201001669
Abstract
No abstract availableKeywords
This publication has 37 references indexed in Scilit:
- Soft Graphoepitaxy of Block Copolymer Assembly with Disposable Photoresist ConfinementNano Letters, 2009
- Local Defectivity Control of 2D Self‐Assembled Block Copolymer PatternsAdvanced Materials, 2007
- Resist-Pattern Guided Self-assembly of Symmetric Diblock CopolymerJournal of Photopolymer Science and Technology, 2006
- Morphology of Ultrathin Supported Diblock Copolymer Films: Theory and ExperimentMacromolecules, 2000
- Equilibrium Orientation of Confined Diblock Copolymer FilmsMacromolecules, 1997
- Controlling Polymer-Surface Interactions with Random Copolymer BrushesScience, 1997
- Observed Surface Energy Effects in Confined Diblock CopolymersPhysical Review Letters, 1996
- A Free Energy Model for Confined Diblock CopolymersMacromolecules, 1994
- Microphase separation in thin films of the symmetric diblock-copolymer meltThe Journal of Chemical Physics, 1994
- Observed frustration in confined block copolymersPhysical Review Letters, 1994