Growth of Hafnium Aluminate Thin Films by Direct Liquid Injection Metallorganic CVD Using Hf [N(C[sub 2]H[sub 5])[sub 2]][sub 4] and Al(O[sup i]C[sub 3]H[sub 7])[sub 3]
- 1 January 2005
- journal article
- Published by The Electrochemical Society in Journal of the Electrochemical Society
- Vol. 152 (2), C108
- https://doi.org/10.1149/1.1851058
Abstract
No abstract availableKeywords
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