The thermal stability of epitaxial GeSn layers
Open Access
- 1 July 2018
- journal article
- research article
- Published by AIP Publishing in APL Materials
- Vol. 6 (7), 076108
- https://doi.org/10.1063/1.5036728
Abstract
We report on the direct observation of lattice relaxation and Sn segregation of GeSn/Ge/Si heterostructures under annealing. We investigated strained and partially relaxed epi-layers with Sn content in the 5 at. %-12 at. % range. In relaxed samples, we observe a further strain relaxation followed by a sudden Sn segregation, resulting in the separation of a β-Sn phase. In pseudomorphic samples, a slower segregation process progressively leads to the accumulation of Sn at the surface only. The different behaviors are explained by the role of dislocations in the Sn diffusion process. The positive impact of annealing on optical emission is also discussed.Keywords
Funding Information
- Deutsche Forschungsgemeinschaft (SiGeSn Laser for Silicon Photonics)
- Bundesministerium für Bildung und Forschung (GESNAPHOTO)
This publication has 24 references indexed in Scilit:
- Abnormal strain in suspended GeSn microstructuresMaterials Research Express, 2018
- Si-Based GeSn Lasers with Wavelength Coverage of 2–3 μm and Operating Temperatures up to 180 KACS Photonics, 2017
- Optically pumped GeSn micro-disks with 16% Sn lasing at 3.1 μm up to 180 KApplied Physics Letters, 2017
- An optically pumped 2.5 μm GeSn laser on Si operating at 110 KApplied Physics Letters, 2016
- Interplay between relaxation and Sn segregation during thermal annealing of GeSn strained layersJournal of Applied Physics, 2016
- Extended X-ray absorption fine structure investigation of Sn local environment in strained and relaxed epitaxial Ge1−xSnx filmsJournal of Applied Physics, 2015
- Lasing in direct-bandgap GeSn alloy grown on SiNature Photonics, 2015
- Strain relaxation and Sn segregation in GeSn epilayers under thermal treatmentApplied Physics Letters, 2013
- Material characterization of high Sn-content, compressively-strained GeSn epitaxial films after rapid thermal processingJournal of Crystal Growth, 2012
- Silicon Photonic Circuits: On-CMOS Integration, Fiber Optical Coupling, and PackagingIEEE Journal of Selected Topics in Quantum Electronics, 2010