In optical lithography, decline in the profundity of centre has become an intense issue, alongside the trouble in improving goal. In memory chip creation, the advancement of stage move cover (PSM) innovation is promising to conquer these issues. Notwithstanding PSM innovation, some super-goal lithographic applications have likewise been proposed. In the later methodology, no PSMs are required, in this manner a portion of the challenges concerning cover innovation can be maintained a strategic distance from. Be that as it may, it isn't in every case simple to apply PSM or super-goal advancements to muddled cover designs, for example, for ASIC, chip rationale IC's. For fine occasional examples, a high spatial frequency upgrading channel is utilized with annular enlightenment. With sideways occurrence enlightenments, light shafts which are significantly diffracted by veil examples can go through the viewpoint student, in this way, the band-width of the spatial frequency transmission qualities of the focal point framework is expanded. The student channel smothers the transmission of direct bars concerning the diffracted pillars, improving the picture differentiates in the high frequency locale. Thorough re-enactments run rapidly on a workstation for complex 20 customary and stage moving covers, substrate bleaching, and optical metrology and arrangement issues.