Low temperature etching of Si in high density plasma using SF6/O2
- 4 February 1995
- journal article
- Published by Elsevier BV in Microelectronic Engineering
- Vol. 27 (1-4), 453-456
- https://doi.org/10.1016/0167-9317(94)00144-j
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Low-Temperature Microwave Plasma Etching of Crystalline SiliconJapanese Journal of Applied Physics, 1991
- Low-temperature dry etchingJournal of Vacuum Science & Technology A, 1991
- Low-temperature reactive ion etching and microwave plasma etching of siliconApplied Physics Letters, 1988