Properties of InGaN quantum-well heterostructures grown on sapphire by metalorganic chemical vapor deposition

Abstract
We report the growth and characterization of InGaN heteroepitaxial thin films and quantum-well heterostructures on (0001) sapphire substrates. The III-N heteroepitaxial layers are grown by metalorganic chemical vapor deposition on sapphire substrates using various growth conditions. A comparison of the 300 K photoluminescence (PL) spectra of the samples indicates that a higher PL intensity is measured for the quantum-well structures having an intentional n -type Si-doping concentration. Furthermore, three-, five-, and eight-period InGaN quantum-well structures exhibit similar narrow PL spectra.