Atmospheric pressure chemical vapor deposition mechanism of Al2O3 film from AlCl3 and O2
- 1 January 2009
- journal article
- Published by Elsevier BV in Journal of Crystal Growth
- Vol. 311 (2), 429-434
- https://doi.org/10.1016/j.jcrysgro.2008.11.061
Abstract
No abstract availableThis publication has 25 references indexed in Scilit:
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