Water and oxygen permeation of silicon nitride films prepared by plasma-enhanced chemical vapor deposition
- 18 November 2004
- journal article
- Published by Elsevier BV in Surface and Coatings Technology
- Vol. 198 (1-3), 114-117
- https://doi.org/10.1016/j.surfcoat.2004.10.034
Abstract
No abstract availableThis publication has 13 references indexed in Scilit:
- Hydrophilic modification of polyethersulfone membranes by low temperature plasma-induced graft polymerizationJournal of Membrane Science, 2002
- Mechanical properties of organic light-emitting thin films deposited on polymer-based barrier substrate: potential for flexible organic light-emitting displaysMaterials Letters, 2002
- Plasma enhanced growth, composition and refractive index of silicon oxynitride filmsMaterials Letters, 2002
- Ultra barrier flexible substrates for flat panel displaysDisplays, 2001
- Tetraethylorthosilicate SiO2 films deposited at a low temperatureMicroelectronics Reliability, 2000
- A study of defects in ultra-thin transparent coatings on polymersSurface and Coatings Technology, 1999
- Ultrahigh rate, wide area, plasma polymerized films from high molecular weight/low vapor pressure liquid or solid monomer precursorsJournal of Vacuum Science & Technology A, 1999
- Transparent barrier coatings on polyethylene terephthalate by single- and dual-frequency plasma-enhanced chemical vapor depositionJournal of Vacuum Science & Technology A, 1998
- Hydrocarbon films inhibit oxygen permeation through plastic packaging materialThin Solid Films, 1998
- Critical ion energy and ion flux in the growth of films by plasma-enhanced chemical-vapor depositionJournal of Vacuum Science & Technology A, 1994