Nanoscale ferromagnetic rings fabricated by electron-beam lithography

Abstract
We have fabricated nanoscale ferromagnetic rings using electron-beam lithography with a lift-off process for pattern transfer. The resist thickness and electron-beam dose were tailored to produce 10 nm thick rings with outer diameters down to 90 nm. Arrays of rings were produced for magneto-optical Kerr effect measurements which show that down to the smallest diameters, reproducible magnetic switching into the flux-closure vortex state is maintained.