Electrochemical aspects of copper chemical mechanical planarization (CMP) in peroxide based slurries containing BTA and glycine
- 15 April 2004
- journal article
- Published by Elsevier BV in Electrochimica Acta
- Vol. 49 (9-10), 1499-1503
- https://doi.org/10.1016/j.electacta.2003.11.010
Abstract
No abstract availableKeywords
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