Temperature accelerated dielectric breakdown of PECVD low-k carbon doped silicon dioxide dielectric thin films
- 1 September 2005
- journal article
- research article
- Published by Springer Science and Business Media LLC in Applied Physics A
- Vol. 81 (4), 767-771
- https://doi.org/10.1007/s00339-004-2715-x
Abstract
No abstract availableKeywords
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