Stress, microstructure and materials reliability of sputter-deposited Fe-N films
- 1 January 1994
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Magnetics
- Vol. 30 (6), 3921-3923
- https://doi.org/10.1109/20.333944
Abstract
No abstract availableThis publication has 4 references indexed in Scilit:
- Magnetics of NiFe and Ti composites-effect of annealingIEEE Transactions on Magnetics, 1992
- Magnetic properties and microstructure of Fe4N and (Fe,Ni)4NJournal of Applied Physics, 1991
- The effects of deposition parameters on iron films RF diode sputtered in argon-nitrogenIEEE Transactions on Magnetics, 1990
- Physical and electro-chemical properties of high rate ion-beam sputtered Fe filmsIEEE Transactions on Magnetics, 1988