EXTREMELY HIGH-DENSITY CAPACITORS WITH ALD HIGH-K DIELECTRIC LAYERS
- 14 February 2006
- book chapter
- Published by Springer Science and Business Media LLC
Abstract
No abstract availableKeywords
This publication has 8 references indexed in Scilit:
- Atomic layer deposition and characterization of hafnium oxide grown on silicon from tetrakis(diethylamino)hafnium and water vaporJournal of Vacuum Science & Technology A, 2004
- Knudsen self- and Fickian diffusion in rough nanoporous mediaThe Journal of Chemical Physics, 2003
- Bias-temperature instabilities of polysilicon gate HfO/sub 2/ MOSFETsIEEE Transactions on Electron Devices, 2003
- High-Density, Low-loss MOS Decoupling Capacitors integrated in a GSM Power AmplifierMRS Proceedings, 2003
- Embedded thin film capacitors-theoretical limitsIEEE Transactions on Advanced Packaging, 2002
- Experimental observations of the thermal stability of high-k gate dielectric materials on siliconJournal of Non-Crystalline Solids, 2002
- Transient Adsorption and Desorption in Micrometer Scale FeaturesJournal of the Electrochemical Society, 2002
- Effects of Surface Roughness on Self- and Transport Diffusion in Porous Media in the Knudsen RegimePhysical Review Letters, 2001