Gold Superfill in Submicrometer Trenches: Experiment and Prediction

Abstract

Bottom-up deposition of gold in fine trenches, also called “superfill,” was recently demonstrated using a submonolayer coverage of preadsorbed, deposition-rate-accelerating lead followed by gold electrodeposition. The present study has used experiments on planar substrates to quantify the effect of Pb adsorption on the Au deposition rate and the rate at which the adsorbed Pb was consumed during the Au deposition process. The values obtained have been incorporated into the curvature enhanced accelerator coverage mechanism of superfill where they were used to quantitatively predict the nonconformal, bottom-up deposition observed during filling of the patterned features. The results indicate the potential of the process for damascene interconnect fabrication in GaAs, GaN, and related technologies.