Fundamental aspects of pulsating current metal electrodeposition I: The effect of the pulsating current on the surface roughness and the porosity of metal deposits
- 31 August 1980
- journal article
- Published by Elsevier BV in Surface Technology
- Vol. 11 (2), 99-109
- https://doi.org/10.1016/0376-4583(80)90024-2
Abstract
No abstract availableKeywords
This publication has 11 references indexed in Scilit:
- The mechanism of copper powder formation in potentiostatic depositionJournal of Applied Electrochemistry, 1980
- Mass Transfer Aspects of Electrolysis by Periodic CurrentsJournal of the Electrochemical Society, 1979
- The Application of Pulsed Current Electrolysis to a Rotating‐Disk Electrode System: I . Mass TransferJournal of the Electrochemical Society, 1978
- Electrocrystallization in pulse electrolysisSurface Technology, 1978
- The mechanism of formation of a surface film of silver on a platinum electrodeJournal of Applied Electrochemistry, 1976
- The effect of pulsating potential electrolysis on the porosity of metal depositsJournal of Applied Electrochemistry, 1976
- The effect of pulsating potential on the morphology of metal deposits obtained by mass-transport controlled electrodepositionJournal of Applied Electrochemistry, 1971
- Electrodeposition of Gold by Pulsed CurrentJournal of the Electrochemical Society, 1971
- The Mechanism of the Dendritic Electrocrystallization of ZincJournal of the Electrochemical Society, 1969
- Mechanism of the Formation of Zinc DendritesJournal of the Electrochemical Society, 1968