Effect of Multilayer versus Monolayer Dodecanethiol on Selectivity and Pattern Integrity in Area-Selective Atomic Layer Deposition
- 16 September 2020
- journal article
- research article
- Published by American Chemical Society (ACS) in ACS Applied Materials & Interfaces
- Vol. 12 (37), 42226-42235
- https://doi.org/10.1021/acsami.0c08873
Abstract
Monolayer and multilayer dodecanethiols (DDT) can be assembled onto a copper surface from the vapor phase depending on the initial oxidation state of the copper. The ability of the copper-bound dodecanethiolates to block atomic layer deposition (ALD) and the resulting behavior at the interfaces of Cu/SiO2 patterns during area-selective ALD (AS-ALD) are compared between mono- and multilayers. We show that multilayer DDT is similar to 7 times more effective at blocking ZnO ALD from diethylzinc and water than is monolayer DDT. Conversely, monolayer DDT exhibits better performance than does multilayer DDT in blocking of Al2O3 ALD from trimethylaluminum and water. Investigation into interfacial effects at the interface between Cu and SiO2 on Cu/SiO2 patterns reveals both a gap at the SiO2 edges and a pitch sizedependent nucleation delay of ZnO ALD on SiO2 regions of multilayer DDT-coated patterns. In contrast, no impact on ZnO ALD is observed on the SiO2 regions of monolayer DDT-coated patterns. We also show that these interfacial effects depend on the ALD chemistry. Whereas an Al2O3 film grows on the TaN diffusion barrier of a DDT-treated Cu/SiO2 pattern, the ZnO film does not. These results indicate that the structure of the DDT layer and the ALD precursor chemistry both play an important role in achieving AS-ALD.Funding Information
- National Science Foundation (ECCS-1542152)
This publication has 53 references indexed in Scilit:
- Electrochemical and Spectroscopic Study of the Self-Assembling Mechanism of Normal and Chelating Alkanethiols on CopperLangmuir, 2012
- Interaction of Oxidized Copper Surfaces with Alkanethiols in Organic and Aqueous Solvents. The Mechanism of Cu2O ReductionThe Journal of Physical Chemistry C, 2010
- Self-Assembled Monolayers of Thiolates on Metals as a Form of NanotechnologyChemical Reviews, 2005
- Investigation of Self-Assembled Monolayer Resists for Hafnium Dioxide Atomic Layer DepositionChemistry of Materials, 2005
- Application of Volatility Diagrams for Low Temperature, Dry Etching, and Planarization of CopperJournal of the Electrochemical Society, 2002
- An investigation of the structure and properties of layered copper thiolatesJournal of Materials Chemistry, 2001
- Corrosion of Alkanethiol-Covered Cu(100) Surfaces in Hydrochloric Acid Solution Studied by in-Situ Scanning Tunneling MicroscopyLangmuir, 1997
- Formation and Structure of Self-Assembled MonolayersChemical Reviews, 1996
- Surface chemistry of thiols on copper: an efficient way of producing multilayersThin Solid Films, 1994
- Spontaneously organized molecular assemblies. 4. Structural characterization of n-alkyl thiol monolayers on gold by optical ellipsometry, infrared spectroscopy, and electrochemistryJournal of the American Chemical Society, 1987