Toxicity of GO and rGO suspension against P. acnes: Physical puncture and oxidative stress
- 8 February 2021
- journal article
- research article
- Published by IOP Publishing in Materials Research Express
- Vol. 8 (4)
- https://doi.org/10.1088/2053-1591/abe42a
Abstract
Acne vulgaris associated with Propionibacterium acnes (P. acnes) remains one of the most common skin diseases, while lacking of effective and non-resistant treatments. Graphene inclusing graphene oxide (GO) and reduced graphene oxide (rGO) have been triggering abundant attentions due to their astonishing performances in multi research areas. Here, the GO and rGO suspensions with different concentrations and sizes against P. acnes were investigated. The higher the concentration while the smaller the size distribution led to the better the antibacterial performance. And the loss of viability of P. acnes can surprisely achieve 72% under a 100 μg 10000 mesh rGO existed which was induced by physical puncture and oxidative stress. Furthermore, the physiological activities of P. acnes will reduce the GO to rGO which further accelerate its death. This study will provide a rapid, effective and nonresistant method for the treatment of acne.Keywords
Funding Information
- National Natural Science Foundation of China (51662023, 81360162, 61901200, 12064020, 11674136, 81260351)
- National Recruitment Program for Young Professionals (1097816002)
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