Simultaneously Regulating Uniform Zn2+ Flux and Electron Conduction by MOF/rGO Interlayers for High-Performance Zn Anodes

Abstract
Highlights Dendrite-free stable Zn plating/stripping was achieved for over 500 h at 2 mA cm−2. No short-circuit for 10 mAh cm−2 of Zn plating. Zn|MnO2 cells delivered nearly 100% capacity retention over 2000 cycles.