Reaction Mechanisms during Atomic Layer Deposition of AlF3 Using Al(CH3)3 and SF6 Plasma
Open Access
- 10 February 2021
- journal article
- research article
- Published by American Chemical Society (ACS) in The Journal of Physical Chemistry C
- Vol. 125 (7), 3913-3923
- https://doi.org/10.1021/acs.jpcc.0c10695
Abstract
No abstract availableKeywords
Funding Information
- Nederlandse Organisatie voor Wetenschappelijk Onderzoek (Zwaartekracht program “Research Centre for Integ)
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