Fabrication of nanostructured Ti thin film with Ti deposition in He plasmas
- 19 February 2021
- journal article
- research article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 60 (3), 038004
- https://doi.org/10.35848/1347-4065/abe3a5
Abstract
Titanium and helium were simultaneously deposited on a titanium thin film sample to prepare a sample with nanocone structures. It was confirmed that the shape and size of the surface structure varied with the change of the amount of titanium deposition. The crystal structure after oxidation treatment in the air had an anatase structure. A combination of the anatase structure, and the increase in the surface area could be beneficial for photocatalytic applications.Keywords
Funding Information
- Japan Society for the Promotion of Science (17KK0132)
- National Institutes of Natural Sciences (01411702)
- National Institute for Fusion Science (NIFS19KOAH036)
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