Modeling UV-C irradiation chambers for mask decontamination using Zemax OpticStudio
- 1 September 2020
- journal article
- research article
- Published by Optica Publishing Group in Applied Optics
- Vol. 59 (25), 7596-7605
- https://doi.org/10.1364/AO.402603
Abstract
Ultraviolet decontamination of personal protective equipment, particularly masks, is important in situations where mask reuse is practiced. To assist in the development of UV-C decontamination chambers, we have constructed ray tracing models in Zemax OpticStudio v20.1 for two distinct geometries, namely, a rectangular cabinet and a cylindrical can. These models provide irradiance distributions that can be used for comparison with experiment, as well as to predict local irradiance variation over the surface of a mask. In this paper we describe the model details, including: (1) a mask object in CAD format; (2) our assumptions for modeling surface properties; (3) the use of polygon object detectors for local irradiance analysis; and (4) experimental results that compare favorably to the simulations. (C) 2020 Optical Society of AmericaThis publication has 1 reference indexed in Scilit: