Effect of atomic layer deposited Al2O3 and subsequent annealing on the nanomechanical properties on various substrates
- 26 January 2021
- journal article
- research article
- Published by Springer Science and Business Media LLC in Journal of Materials Science
- Vol. 56 (13), 7879-7888
- https://doi.org/10.1007/s10853-021-05804-6
Abstract
No abstract availableKeywords
This publication has 31 references indexed in Scilit:
- Mechanical response of atomic layer deposition alumina coatings on stiff and compliant substratesJournal of Vacuum Science & Technology A, 2011
- The influence of substrate on the adhesion behaviors of atomic layer deposited aluminum oxide filmsSurface and Coatings Technology, 2011
- Estimation of interfacial fracture toughness based on progressive edge delamination of a thin transparent coating on a polymer substrateActa Materialia, 2010
- Mechanical properties at the nanometer scale of GDC and YSZ used as electrolytes for solid oxide fuel cellsActa Materialia, 2010
- Growth, structure, and tribological behavior of atomic layer-deposited tungsten disulphide solid lubricant coatings with applications to MEMSActa Materialia, 2006
- Evaluation of elastic modulus and hardness of thin films by nanoindentationJournal of Materials Research, 2004
- Atomic Layer Deposition Chemistry: Recent Developments and Future ChallengesAngewandte Chemie, 2003
- Nanoindentation of Si, GaP, GaAs and ZnSe single crystalsJournal of Physics D: Applied Physics, 2002
- Adhesion and debonding of multi-layer thin film structuresEngineering Fracture Mechanics, 1998
- An improved technique for determining hardness and elastic modulus using load and displacement sensing indentation experimentsJournal of Materials Research, 1992