Thermal gas-phase etching of titanium nitride (TiN) by thionyl chloride (SOCl2)
Open Access
- 4 November 2020
- journal article
- research article
- Published by Elsevier BV in Applied Surface Science
- Vol. 540, 148309
- https://doi.org/10.1016/j.apsusc.2020.148309
Abstract
No abstract availableThis publication has 39 references indexed in Scilit:
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