Hydrogen diffusion behavior in CH2P-molecular-ion-implanted silicon wafers for CMOS image sensors
Open Access
- 24 September 2021
- journal article
- research article
- Published by Elsevier BV in Materials Science in Semiconductor Processing
- Vol. 137, 106211
- https://doi.org/10.1016/j.mssp.2021.106211
Abstract
No abstract availableKeywords
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