Remarkably stable high mobility self-aligned oxide TFT by investigating the effect of oxygen plasma time during PEALD of SiO2 gate insulator
- 13 October 2021
- journal article
- research article
- Published by Elsevier BV in Journal of Alloys and Compounds
- Vol. 893, 162308
- https://doi.org/10.1016/j.jallcom.2021.162308
Abstract
No abstract availableKeywords
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