Impact of La Concentration on Ferroelectricity of La-Doped HfO2 Epitaxial Thin Films
Open Access
- 19 October 2021
- journal article
- research article
- Published by American Chemical Society (ACS) in ACS Applied Electronic Materials
- Vol. 3 (11), 4809-4816
- https://doi.org/10.1021/acsaelm.1c00672
Abstract
No abstract availableKeywords
Funding Information
- Fundaci??n BBVA
- Agence Nationale de la Recherche (ANR-15-CE08-0034, ANR-16-CE24-0022, ANR-17-CE05-0018)
- Consejo Superior de Investigaciones Cient??ficas (LINKA20338)
- Ministerio de Ciencia e Innovaci??n (CEX2019-000917-S, MAT2017-85232-R, PID2019-107727RB-I00, PID2020-112548RB-I00, RYC-2017-22531)
- European Regional Development Fund (MAT2017-85232- R, PID2019-107727RB-I00, PID2020-112548RB-I00)
- Centre National de la Recherche Scientifique
- Generalitat de Catalunya (2017 SGR 1377)
- China Scholarship Council (201807000104, 201906050014)
- Universitat Aut??noma de Barcelona
- H2020 European Research Council (644453)
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